000 00467nam a2200133Ia 4500
008 211224s9999 xx 000 0 und d
020 _a9780819452894
082 _a686.2325 STU
245 0 _aAdvances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA
260 _aBellingham, Wash:
_bSPIE,
_c2004
300 _a2 v. (xxxviii, 1288 p.) : ill. ; 28 cm
650 _aMicrolithography - Congresses
700 _aSturtevant, John L
999 _c12347
_d12347