000 00454nam a2200133Ia 4500
008 211224s9999 xx 000 0 und d
020 _a9780819448446
082 _a621.381531 FED
245 0 _aAdvances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA
260 _aBellingham, Wash:
_bSPIE,
_c2003
300 _a2 v. : ill. ; 28 cm
650 _aMicrolithography - Congresses
700 _aFedynyshyn, Theodore H
999 _c12346
_d12346