| 000 | 00490nam a2200133Ia 4500 | ||
|---|---|---|---|
| 008 | 211224s9999 xx 000 0 und d | ||
| 020 | _a9780819454713 | ||
| 082 | _a681.428 KHQ | ||
| 245 | 0 | _aAdvances in mirror technology for x-ray, EUV lithography, laser and other applications II : 5 August, 2004, Denver, Colorado, USA | |
| 260 |
_aBellingham, Wash: _bSPIE, _c2004 |
||
| 300 | _aix, 194 p. : ill. ; 28 cm | ||
| 650 | _aExtreme ultraviolet lithography - Congresses | ||
| 700 | _aDinger, Udo | ||
| 999 |
_c12196 _d12196 |
||