| 000 | 00426nam a2200145Ia 4500 | ||
|---|---|---|---|
| 008 | 211224s9999 xx 000 0 und d | ||
| 020 | _a9780819475572 | ||
| 082 | _a621.381531 WEI | ||
| 100 | _aWei, Yayi | ||
| 245 | 0 | _aAdvanced processes for 193-nm immersion lithography | |
| 260 |
_aBellingham, Wash: _bSPIE, _c2009 |
||
| 300 | _axix, 315 p. : ill. ; 26 cm | ||
| 650 | _aImmersion lithography | ||
| 700 | _aBrainard, Robert L | ||
| 999 |
_c11650 _d11650 |
||