Amazon cover image
Image from Amazon.com
Image from Google Jackets

Advanced processes for 193-nm immersion lithography

By: Contributor(s): Material type: TextTextPublication details: Bellingham, Wash: SPIE, 2009Description: xix, 315 p. : ill. ; 26 cmISBN:
  • 9780819475572
Subject(s): DDC classification:
  • 621.381531 WEI
Item type:
Tags from this library: No tags from this library for this title. Log in to add tags.
Star ratings
    Average rating: 0.0 (0 votes)
No physical items for this record

There are no comments on this title.

to post a comment.

Powered by Koha