Art and innovation : the Xerox PARC artist-in-residence program 

 - Cambridge, Mass:  MIT Press,  1999 
 - xiii, 293 p., 6 p. of plates : ill. (some col.) ; 24 cm. ; hbk. : alk. paper 
<br/><br/><label>ISBN: </label>9780262082754 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Art and technology
<br/><br/><label>Dewey Class. No.: </label>700.1050979473 HAR