Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA 

 - Bellingham, Wash:  SPIE,  2004 
 - 2 v. (xxxviii, 1288 p.) : ill. ; 28 cm 
<br/><br/><label>ISBN: </label>9780819452894 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>686.2325 STU