Advances in resist technology and processing XX : 24-26 February, 2003, Santa Clara, California, USA 

 - Bellingham, Wash:  SPIE,  2003 
 - 2 v. : ill. ; 28 cm 
<br/><br/><label>ISBN: </label>9780819448446 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381531 FED