Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA 

 - Bellingham, Wash:  SPIE,  2001 
 - 2 v. (xxix, 1084 p.) : ill. ; 28 cm 
<br/><br/><label>ISBN: </label>9780819440310 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381531 HOU