Advances in resist technology and processing XIX : 4-6 March, 2002, Santa Clara, [California] USA 

 - Bellingham, Wash:  SPIE,  2002 
 - 2 v. : ill. ; 28 cm 
<br/><br/><label>ISBN: </label>9780819444363 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.3815 FED