Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States 

 - Bellingham, Wash:  SPIE,  2010 
 - 2 v. (various pagings) : ill. ; 28 cm 
<br/><br/><label>ISBN: </label>9780819480538 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>621.381531 ALL