Advances in mirror technology for x-ray, EUV lithography, laser and other applications II : 5 August, 2004, Denver, Colorado, USA 

 - Bellingham, Wash:  SPIE,  2004 
 - ix, 194 p. : ill. ; 28 cm 
<br/><br/><label>ISBN: </label>9780819454713 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Extreme ultraviolet lithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>681.428 KHQ