Advances in mirror technology for x-ray, EUV lithography, laser and other applications : 7-8 August 2003, San Diego, California, USA 

 - Bellingham, Wash:  SPIE,  2004 
 - ix, 222 p. : ill. (some col.) ; 28 cm 
<br/><br/><label>ISBN: </label>9780819450661 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Extreme ultraviolet lithography - Congresses
<br/><br/><label>Dewey Class. No.: </label>522.6863 KHO