Wei, Yayi <br/><br/>
Advanced processes for 193-nm immersion lithography 

 - Bellingham, Wash:  SPIE,  2009 
 - xix, 315 p. : ill. ; 26 cm 
<br/><br/><label>ISBN: </label>9780819475572 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Immersion lithography
<br/><br/><label>Dewey Class. No.: </label>621.381531 WEI