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Advances in mirror technology for x-ray, EUV lithography, laser and other applications II : 5 August, 2004, Denver, Colorado, USA

Contributor(s): Material type: TextTextPublication details: Bellingham, Wash: SPIE, 2004Description: ix, 194 p. : ill. ; 28 cmISBN:
  • 9780819454713
Subject(s): DDC classification:
  • 681.428 KHQ
Item type:
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