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Art and innovation : the Xerox PARC artist-in-residence program

Art and innovation : the Xerox PARC artist-in-residence program - Cambridge, Mass: MIT Press, 1999 - xiii, 293 p., 6 p. of plates : ill. (some col.) ; 24 cm. ; hbk. : alk. paper

ISBN: 9780262082754

Subjects--Topical Terms:
Art and technology

Dewey Class. No.: 700.1050979473 HAR

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