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Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA

Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA - Bellingham, Wash: SPIE, 2001 - 2 v. (xxix, 1084 p.) : ill. ; 28 cm

ISBN: 9780819440310

Subjects--Topical Terms:
Microlithography - Congresses

Dewey Class. No.: 621.381531 HOU

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