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Advances in resist technology and processing XVII : 28 February-1 march, 2000, Santa Clara, USA

Houlihan, Francis M

Advances in resist technology and processing XVII : 28 February-1 march, 2000, Santa Clara, USA - Bellingham, WA: SPIE, 2000 - xvii, 618 p. : ill. ; 29 cm

ISBN: 9780819436177

Subjects--Topical Terms:
Microlithography

Dewey Class. No.: 686.2325 HOU

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