Normal view MARC view ISBD view

Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States

Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States - Bellingham, Wash: SPIE, 2010 - 2 v. (various pagings) : ill. ; 28 cm

ISBN: 9780819480538

Subjects--Topical Terms:
Microlithography - Congresses

Dewey Class. No.: 621.381531 ALL

Print
Add to your cart (remove)
Save record
BIBTEX Dublin Core MARCXML MARC (non-Unicode/MARC-8) MARC (Unicode/UTF-8) MARC (Unicode/UTF-8, Standard) MODS (XML) RIS ISBD
More searches

Search for this title in:
Other Libraries (WorldCat) Other Databases (Google Scholar) Online Stores (Bookfinder.com) Open Library (openlibrary.org)