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Advances in mirror technology for x-ray, EUV lithography, laser and other applications II : 5 August, 2004, Denver, Colorado, USA

Advances in mirror technology for x-ray, EUV lithography, laser and other applications II : 5 August, 2004, Denver, Colorado, USA - Bellingham, Wash: SPIE, 2004 - ix, 194 p. : ill. ; 28 cm

ISBN: 9780819454713

Subjects--Topical Terms:
Extreme ultraviolet lithography - Congresses

Dewey Class. No.: 681.428 KHQ

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