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Advances in mirror technology for x-ray, EUV lithography, laser and other applications : 7-8 August 2003, San Diego, California, USA

Advances in mirror technology for x-ray, EUV lithography, laser and other applications : 7-8 August 2003, San Diego, California, USA - Bellingham, Wash: SPIE, 2004 - ix, 222 p. : ill. (some col.) ; 28 cm

ISBN: 9780819450661

Subjects--Topical Terms:
Extreme ultraviolet lithography - Congresses

Dewey Class. No.: 522.6863 KHO

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